Non-contact XUV metrology of Ru/B 4 C multilayer optics by means of Hartmann wavefront analysis - ENSTA Paris - École nationale supérieure de techniques avancées Paris
Journal Articles Applied optics Year : 2018

Non-contact XUV metrology of Ru/B 4 C multilayer optics by means of Hartmann wavefront analysis

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Physics [physics] Optics [physics.optics]

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https://ensta-paris.hal.science/hal-01773850

Submitted on : Monday, April 23, 2018-11:18:19 AM

Last modification on : Monday, August 5, 2024-2:50:03 PM

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hal-01773850 , version 1 (23-04-2018)

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Mabel Ruiz-Lopez, Hugo Dacasa, Benoît Mahieu, Magali Lozano, Lu Li, et al.. Non-contact XUV metrology of Ru/B 4 C multilayer optics by means of Hartmann wavefront analysis. Applied optics, 2018, 57 (6), ⟨10.1364/AO.57.001315⟩. ⟨hal-01773850⟩

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